US Patent Issued to Nanyang Technological University on Sept. 28 for "Bioslurry-induced water barrier and process of forming thereof" (Singaporean Inventors)

Press/Media: Research

PeriodSept 29 2021

Media coverage

1

Media coverage

  • TitleUS Patent Issued to Nanyang Technological University on Sept. 28 for "Bioslurry-induced water barrier and process of forming thereof" (Singaporean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date9/29/21
    PersonsChu Jian
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