Adhesion studies of Ta/low-k (black diamond) interface using thermocompressive wafer bonding and four-point bend

W. H. Teh*, C. F. Tsang, A. Trigg, K. W. Teoh, R. Kumar, N. Balasubramanian, D. L. Kwong, S. E. Ong, Farah Malik, C. L. Gan

*Corresponding author for this work

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Material Science

Engineering