Deposition of nanostructured thin films using an inductively coupled plasma chemical vapor deposition technique

Engineering

• Nanomaterial 100%
• Thin Films 100%
• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Inductively Coupled Plasma 100%
• Promising Candidate 33%
• Radio Frequency 33%
• Structural Property 33%
• Deposition System 33%
• Gas Sensor 33%
• Realization 33%
• Deposited Film 33%
• Building Block 33%
• Probe Point 33%
• Sensing Layer 33%
• X-Ray Diffraction Analysis 33%

Material Science

• Thin Films 100%
• Nanostructured Material 100%
• Chemical Vapor Deposition 100%
• Oxide Compound 66%
• Tin 66%
• Scanning Electron Microscopy 33%
• Film 33%
• Structural Property 33%
• X Ray Diffraction Analysis 33%

Keyphrases

• Fundamental Building Blocks 33%
• Radio Frequency Inductively Coupled Plasma 33%
• Oxide Deposition 33%
• Dynamic Conductance 33%