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Development and applications of a laser writing lithography system for maskless patterning
Yuen Chuen Chan*, Yee Loy Lam, Yan Zhou, Feng Lan Xu, Chin Yi Liaw, Wei Jiang, Jaeshin Ahn
*Corresponding author for this work
- Nanyang Technological University
- The University of Tokyo
- Japan Society of Applied Physics
- National University of Singapore
- University of Michigan, Ann Arbor
- Rank O'Connor's (S) Pte Ltd.
- Photonics Research Group
- University of Glasgow
- Jilin University
- CAS - Changchun Institute of Optics Fine Mechanics and Physics
- NTU
Research output: Contribution to journal › Article › peer-review
29
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(Scopus)