Dip-pen nanolithography-generated patterns used as gold etch resists: A comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol

Gang Lu, Yanhong Chen, Bing Li, Xiaozhu Zhou, Can Xue, Jan Ma, Freddy Y.C. Boey, Hua Zhang*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

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