Direct evidence of electromigration failure mechanism in dual-damascene Cu interconnect tree structures

A. V. Vairagar*, S. G. Mhaisalkar, M. A. Meyer, E. Zschech, Ahila Krishnamoorthy, K. N. Tu, A. M. Gusak

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Direct evidence of electromigration failure mechanism in dual-damascene Cu interconnect tree structures'. Together they form a unique fingerprint.

Computer Science

Material Science

Keyphrases