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Effect of in-line electron beam treatment on the electrical performance of Cu/organic low-κ damascene interconnects
Zhe Chen*, K. Prasad, Z. H. Gan, S. Y. Wu, S. S. Mehta, N. Jiang, S. G. Mhaisalkar, Rakesh Kumar, C. Y. Li
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
4
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(Scopus)