Effect of nickel silicide induced dopant segregation on vertical silicon nanowire diode performance

W. Lu*, K. L. Pey, N. Singh, K. C. Leong, Q. Liu, C. L. Gan, G. Q. Lo, D. L. Kwong, C. S. Tan

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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