Electronic transport properties of nitrogen doped amorphous carbon films deposited by the filtered cathodic vacuum arc technique

Engineering

• Amorphous Carbon 100%
• Deposited Film 100%
• Fermi Level 100%
• Thin Films 66%
• Tetrahedral Amorphous Carbon 66%
• Range Variable 66%
• Temperature Range 33%
• Room Temperature 33%
• Partial Pressure 33%
• Band Gap 33%
• Valence Band 33%
• Conduction Band 33%
• Torr 33%
• Nitrogen Flow Rate 33%
• Dopants 33%
• Band Tail 33%
• Level Shift 33%
• Transport Mechanism 33%

Material Science

• Thin Films 100%
• Carbon Films 100%
• Amorphous Carbon 100%
• Tetrahedral Amorphous Carbon 100%
• Density 50%
• Film 50%
• Doping (Additives) 50%

Keyphrases

• Nitrogen-doped Amorphous Carbon 100%
• Hopping Transport 66%
• Transport Parameters 66%
• Electronic Transport Mechanism 33%
• Fermi Level Shift 33%