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Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing
K. K. Ong*, K. L. Pey, P. S. Lee, A. T.S. Wee, X. C. Wang, L. H. Wong
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
1
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(Scopus)