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Interfacial reactions of Ni on Si 1-xGe x (x=0.2,0.3) at low temperature by rapid thermal annealing
H. B. Zhao*, K. L. Pey, W. K. Choi, S. Chattopadhyay, E. A. Fitzgerald, D. A. Antoniadis, P. S. Lee
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
65
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(Scopus)