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Lu2O3/Al2O gate dielectrics for germanium metal-oxide-semiconductor devices
P. Darmawan*, M. Y. Chan, T. Zhang, Y. Setiawan, H. L. Seng, T. K. Chan, T. Osipowicz, P. S. Lee
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
10
Citations
(Scopus)