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Reservoir effect and the role of low current density regions on electromigration lifetimes in copper interconnects
Z. H. Gan*, W. Shao, S. G. Mhaisalkar, Z. Chen, Hongyu Li, K. N. Tu, A. M. Gusak
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
18
Citations
(Scopus)