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Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
K. K. Ong*, K. L. Pey, P. S. Lee, A. T.S. Wee, X. C. Wang, C. H. Tung, L. J. Tang, Y. F. Chong
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
4
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(Scopus)