Thermal effects on LPCVD amorphous silicon

Engineering

• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Thermal Effect 100%
• Annealing Temperature 100%
• Annealing Time 100%
• Ray Diffraction 50%
• Nanocrystalline 50%
• Atomic Force Microscope 50%
• Stress Relief 50%
• Holding Time 50%
• Thermal Cycle 50%
• Film Silicon 50%

Material Science

• Low Pressure Chemical Vapor Deposition 100%
• Amorphous Silicon 100%
• Annealing 60%
• Film 40%
• X-Ray Diffraction 20%
• Silicon 20%
• Photoluminescence 20%
• Grain Size 20%
• Surface Roughness 20%
• Nanocrystalline 20%
• Stress Measurement 20%

Keyphrases

• Curvature Analysis 25%