Abstract
The proton beam writing technique is a direct write lithographic technique that is being actively developed at the Centre for Ion Beam Applications, National University of Singapore for microphotonic applications. The technique utilizes a highly focused beam of MeV protons to pattern or modify the refractive index of various materials including polymers, glasses and other inorganic crystals. The technique has been applied to the fabrication of several different types of microoptical components including waveguides, gratings, microlens arrays and colloidal crystal templates. In this paper we give a review of the progress made thus far by our group and other workers in the field of microphotonics using proton beam writing.
Original language | English |
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Pages (from-to) | 364-371 |
Number of pages | 8 |
Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
Volume | 231 |
Issue number | 1-4 |
DOIs | |
Publication status | Published - Apr 2005 |
Externally published | Yes |
Event | Nuclear Microprobe Technology and Applications Proceedings of the 9th International Conference on Nuclear Microprobe Technology and ICNMTA 2004 - Duration: Sept 13 2004 → Sept 17 2004 |
ASJC Scopus Subject Areas
- Nuclear and High Energy Physics
- Instrumentation
Keywords
- Gratings
- Microlens arrays
- Photonics
- Proton beam writing
- Waveguides