A progress review of proton beam writing applications in microphotonics

A. A. Bettiol*, T. C. Sum, F. C. Cheong, C. H. Sow, S. Venugopal Rao, J. A. Van Kan, E. J. Teo, K. Ansari, F. Watt

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

55 Citations (Scopus)

Abstract

The proton beam writing technique is a direct write lithographic technique that is being actively developed at the Centre for Ion Beam Applications, National University of Singapore for microphotonic applications. The technique utilizes a highly focused beam of MeV protons to pattern or modify the refractive index of various materials including polymers, glasses and other inorganic crystals. The technique has been applied to the fabrication of several different types of microoptical components including waveguides, gratings, microlens arrays and colloidal crystal templates. In this paper we give a review of the progress made thus far by our group and other workers in the field of microphotonics using proton beam writing.

Original languageEnglish
Pages (from-to)364-371
Number of pages8
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume231
Issue number1-4
DOIs
Publication statusPublished - Apr 2005
Externally publishedYes
EventNuclear Microprobe Technology and Applications Proceedings of the 9th International Conference on Nuclear Microprobe Technology and ICNMTA 2004 -
Duration: Sept 13 2004Sept 17 2004

ASJC Scopus Subject Areas

  • Nuclear and High Energy Physics
  • Instrumentation

Keywords

  • Gratings
  • Microlens arrays
  • Photonics
  • Proton beam writing
  • Waveguides

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