A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process

Xiaocheng Li; Kang Tay Beng; Guofeng You; Yi Yang

doi:10.1109/INEC.2008.4585619

A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process

Xiaocheng Li, Kang Tay Beng, Guofeng You, Yi Yang

Nanyang Technological University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

Abstract

We present a simple method to fabricate large area of silicon nanowires array with low-cost and throughput by a catalytic electrochemical etching process. In our experiment, a thin layer of polyelectrolyte (PAH) was used to absorb negatively charged PS sphere. Using the PS sphere as mask, the silicon nanowires arrays were fabricated by a silver catalytic electrochemical etching process. By SEM and Raman spectrum, the structure and properties of silicon nanowires arrays were also studied.

Original language	English
Title of host publication	2008 2nd IEEE International Nanoelectronics Conference, INEC 2008
Pages	860-862
Number of pages	3
DOIs	https://doi.org/10.1109/INEC.2008.4585619
Publication status	Published - 2008
Externally published	Yes
Event	2008 2nd IEEE International Nanoelectronics Conference, INEC 2008 - Shanghai, China Duration: Mar 24 2008 → Mar 27 2008

Publication series

Name	2008 2nd IEEE International Nanoelectronics Conference, INEC 2008

Conference

Conference	2008 2nd IEEE International Nanoelectronics Conference, INEC 2008
Country/Territory	China
City	Shanghai
Period	3/24/08 → 3/27/08

ASJC Scopus Subject Areas

Electrical and Electronic Engineering

Access to Document

10.1109/INEC.2008.4585619

Cite this

@inproceedings{6324d348991b491f877eb5f8253fa277,

title = "A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process",

abstract = "We present a simple method to fabricate large area of silicon nanowires array with low-cost and throughput by a catalytic electrochemical etching process. In our experiment, a thin layer of polyelectrolyte (PAH) was used to absorb negatively charged PS sphere. Using the PS sphere as mask, the silicon nanowires arrays were fabricated by a silver catalytic electrochemical etching process. By SEM and Raman spectrum, the structure and properties of silicon nanowires arrays were also studied.",

author = "Xiaocheng Li and Beng, {Kang Tay} and Guofeng You and Yi Yang",

year = "2008",

doi = "10.1109/INEC.2008.4585619",

language = "English",

isbn = "9781424415731",

series = "2008 2nd IEEE International Nanoelectronics Conference, INEC 2008",

pages = "860--862",

booktitle = "2008 2nd IEEE International Nanoelectronics Conference, INEC 2008",

note = "2008 2nd IEEE International Nanoelectronics Conference, INEC 2008 ; Conference date: 24-03-2008 Through 27-03-2008",

}

Li, X, Beng, KT, You, G & Yang, Y 2008, A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process. in 2008 2nd IEEE International Nanoelectronics Conference, INEC 2008., 4585619, 2008 2nd IEEE International Nanoelectronics Conference, INEC 2008, pp. 860-862, 2008 2nd IEEE International Nanoelectronics Conference, INEC 2008, Shanghai, China, 3/24/08. https://doi.org/10.1109/INEC.2008.4585619

A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process. / Li, Xiaocheng; Beng, Kang Tay; You, Guofeng et al.
2008 2nd IEEE International Nanoelectronics Conference, INEC 2008. 2008. p. 860-862 4585619 (2008 2nd IEEE International Nanoelectronics Conference, INEC 2008).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process

AU - Li, Xiaocheng

AU - Beng, Kang Tay

AU - You, Guofeng

AU - Yang, Yi

PY - 2008

Y1 - 2008

N2 - We present a simple method to fabricate large area of silicon nanowires array with low-cost and throughput by a catalytic electrochemical etching process. In our experiment, a thin layer of polyelectrolyte (PAH) was used to absorb negatively charged PS sphere. Using the PS sphere as mask, the silicon nanowires arrays were fabricated by a silver catalytic electrochemical etching process. By SEM and Raman spectrum, the structure and properties of silicon nanowires arrays were also studied.

AB - We present a simple method to fabricate large area of silicon nanowires array with low-cost and throughput by a catalytic electrochemical etching process. In our experiment, a thin layer of polyelectrolyte (PAH) was used to absorb negatively charged PS sphere. Using the PS sphere as mask, the silicon nanowires arrays were fabricated by a silver catalytic electrochemical etching process. By SEM and Raman spectrum, the structure and properties of silicon nanowires arrays were also studied.

UR - http://www.scopus.com/inward/record.url?scp=52649159854&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=52649159854&partnerID=8YFLogxK

U2 - 10.1109/INEC.2008.4585619

DO - 10.1109/INEC.2008.4585619

M3 - Conference contribution

AN - SCOPUS:52649159854

SN - 9781424415731

T3 - 2008 2nd IEEE International Nanoelectronics Conference, INEC 2008

SP - 860

EP - 862

BT - 2008 2nd IEEE International Nanoelectronics Conference, INEC 2008

T2 - 2008 2nd IEEE International Nanoelectronics Conference, INEC 2008

Y2 - 24 March 2008 through 27 March 2008

ER -

A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process

Abstract

Publication series

Conference

ASJC Scopus Subject Areas

Access to Document

Other files and links

Fingerprint

Cite this