Abstract
Large area nitrogen (N)-doped graphene films were grown on copper foil by chemical vapor deposition. The as-grown films consisted of a single atomic layer that was continuous across the copper surface steps and grain boundaries, and could be easily transferred to a variety of substrates. N-doping was confirmed by X-ray photoelectron spectroscopy, Raman spectroscopy, and elemental mapping. N atoms were suggested to mainly form a "pyrrolic" nitrogen structure, and the doping level of N reached up to 3.4 at.%. The N-doped graphene exhibited an n-type behavior, and nitrogen doping would open a band gap in the graphene. This study presents use of a new liquid precursor to obtain large area, continuous and mostly single atom layer N-doped graphene films.
Original language | English |
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Pages (from-to) | 4476-4482 |
Number of pages | 7 |
Journal | Carbon |
Volume | 50 |
Issue number | 12 |
DOIs | |
Publication status | Published - Oct 2012 |
Externally published | Yes |
ASJC Scopus Subject Areas
- General Chemistry
- General Materials Science