Al2O3 nanocrystals embedded in amorphous Lu 2O3 high-k gate dielectric for floating gate memory application

C. L. Yuan*, M. Y. Chan, P. S. Lee, P. Darmawan, Y. Setiawan

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

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Material Science

Engineering

Chemical Engineering

Physics