An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

J. B. Yi; Y. Z. Zhou; J. Ding; G. M. Chow; Z. L. Dong; T. White; Xing Yu Gao; A. T.S. Wee; X. J. Yu

doi:10.1016/j.jmmm.2004.06.052

An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

J. B. Yi, Y. Z. Zhou, J. Ding^*, G. M. Chow, Z. L. Dong, T. White, Xing Yu Gao, A. T.S. Wee, X. J. Yu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

46 Citations (Scopus)

Abstract

Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500°C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure.

Original language	English
Pages (from-to)	303-311
Number of pages	9
Journal	Journal of Magnetism and Magnetic Materials
Volume	284
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jmmm.2004.06.052
Publication status	Published - Dec 2004
Externally published	Yes

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

Keywords

Amorphous structure
Anisotropic magnetoresistance (AMR)
Magnetization
Ni film
Sputtering

Access to Document

10.1016/j.jmmm.2004.06.052

Cite this

@article{16f1968c15d849c596942b7feb7eb34d,

title = "An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering",

abstract = "Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500°C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure.",

keywords = "Amorphous structure, Anisotropic magnetoresistance (AMR), Magnetization, Ni film, Sputtering",

author = "Yi, {J. B.} and Zhou, {Y. Z.} and J. Ding and Chow, {G. M.} and Dong, {Z. L.} and T. White and Gao, {Xing Yu} and Wee, {A. T.S.} and Yu, {X. J.}",

year = "2004",

month = dec,

doi = "10.1016/j.jmmm.2004.06.052",

language = "English",

volume = "284",

pages = "303--311",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

publisher = "Elsevier",

number = "1-3",

}

TY - JOUR

T1 - An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

AU - Yi, J. B.

AU - Zhou, Y. Z.

AU - Ding, J.

AU - Chow, G. M.

AU - Dong, Z. L.

AU - White, T.

AU - Gao, Xing Yu

AU - Wee, A. T.S.

AU - Yu, X. J.

PY - 2004/12

Y1 - 2004/12

N2 - Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500°C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure.

AB - Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500°C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure.

KW - Amorphous structure

KW - Anisotropic magnetoresistance (AMR)

KW - Magnetization

KW - Ni film

KW - Sputtering

UR - http://www.scopus.com/inward/record.url?scp=10044297547&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=10044297547&partnerID=8YFLogxK

U2 - 10.1016/j.jmmm.2004.06.052

DO - 10.1016/j.jmmm.2004.06.052

M3 - Article

AN - SCOPUS:10044297547

SN - 0304-8853

VL - 284

SP - 303

EP - 311

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - 1-3

ER -

An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

Abstract

ASJC Scopus Subject Areas

Keywords

Access to Document

Other files and links

Fingerprint

Cite this