Applications of atomic layer deposition in solar cells

Wenbin Niu; Xianglin Li; Siva Krishna Karuturi; Derrick Wenhui Fam; Hongjin Fan; Santosh Shrestha; Lydia Helena Wong; Alfred Iing Yoong Tok

doi:10.1088/0957-4484/26/6/064001

Applications of atomic layer deposition in solar cells

Wenbin Niu, Xianglin Li, Siva Krishna Karuturi, Derrick Wenhui Fam, Hongjin Fan, Santosh Shrestha, Lydia Helena Wong, Alfred Iing Yoong Tok

Research output: Contribution to journal › Review article › peer-review

93 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.

Original language	English
Article number	064001
Journal	Nanotechnology
Volume	26
Issue number	6
DOIs	https://doi.org/10.1088/0957-4484/26/6/064001
Publication status	Published - Feb 13 2015
Externally published	Yes

Bibliographical note

Publisher Copyright:
© 2015 IOP Publishing Ltd.

ASJC Scopus Subject Areas

Bioengineering
General Chemistry
General Materials Science
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

Keywords

atomic layer deposition
bandstructure engineering
solar cells
surface passivation
surface sensitization

Access to Document

10.1088/0957-4484/26/6/064001

Cite this

@article{ea44e385f74243a4b6c24905abced963,

title = "Applications of atomic layer deposition in solar cells",

abstract = "Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.",

keywords = "atomic layer deposition, bandstructure engineering, solar cells, surface passivation, surface sensitization",

author = "Wenbin Niu and Xianglin Li and Karuturi, \{Siva Krishna\} and Fam, \{Derrick Wenhui\} and Hongjin Fan and Santosh Shrestha and Wong, \{Lydia Helena\} and Tok, \{Alfred Iing Yoong\}",

note = "Publisher Copyright: {\textcopyright} 2015 IOP Publishing Ltd.",

year = "2015",

month = feb,

day = "13",

doi = "10.1088/0957-4484/26/6/064001",

language = "English",

volume = "26",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing Ltd.",

number = "6",

}

TY - JOUR

T1 - Applications of atomic layer deposition in solar cells

AU - Niu, Wenbin

AU - Li, Xianglin

AU - Karuturi, Siva Krishna

AU - Fam, Derrick Wenhui

AU - Fan, Hongjin

AU - Shrestha, Santosh

AU - Wong, Lydia Helena

AU - Tok, Alfred Iing Yoong

PY - 2015/2/13

Y1 - 2015/2/13

N2 - Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.

AB - Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.

KW - atomic layer deposition

KW - bandstructure engineering

KW - solar cells

KW - surface passivation

KW - surface sensitization

UR - http://www.scopus.com/inward/record.url?scp=84921667020&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84921667020&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/26/6/064001

DO - 10.1088/0957-4484/26/6/064001

M3 - Review article

AN - SCOPUS:84921667020

SN - 0957-4484

VL - 26

JO - Nanotechnology

JF - Nanotechnology

IS - 6

M1 - 064001

ER -

Applications of atomic layer deposition in solar cells

Abstract

Bibliographical note

ASJC Scopus Subject Areas

Keywords

Access to Document

Other files and links

Fingerprint

Cite this