Atomic layer deposition ZnO film as seed layer for hydrothermal growth of ZnO nanorods

X. L. Li, C. W. Cheng, H. J. Fan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Atomic layer deposition (ALD) ZnO film as seed layer for growing aligned ZnO nanorods arrays is demonstrated. The effects of the deposition temperature and film thickness to the morphology of the ZnO nanorods are studied. The ALD is found to have its advantage over the conventional dip-coating method when being applied to three-dimensional (3D) substrates, as exemplified by the macroporous Si adn CNT arrays. As one example, the CNT-ZnO 3D hybrid nanostructures are obtained which might be useful for energy-related applications.

Original languageEnglish
Title of host publicationLow-Dimensional Functional Nanostructures - Fabrication, Characterization and Applications
PublisherMaterials Research Society
Pages171-177
Number of pages7
ISBN (Print)9781605112350
DOIs
Publication statusPublished - 2010
Externally publishedYes

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1258
ISSN (Print)0272-9172

ASJC Scopus Subject Areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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