Band-gap expansion, core-level shift, and dielectric suppression of porous silicon passivated by plasma fluorination

L. K. Pan*, Y. K. Ee, C. Q. Sun, G. Q. Yu, Q. Y. Zhang, B. K. Tay

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Citations (Scopus)
Original languageEnglish
Pages (from-to)583-587
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number2
DOIs
Publication statusPublished - 2004
Externally publishedYes

ASJC Scopus Subject Areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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