Characterization of (Ti, Al)N films deposited by off-plane double bend filtered cathodic vacuum arc

Y. H. Cheng; B. K. Tay; S. P. Lau; X. Shi; H. C. Chua

doi:10.1116/1.1351063

Characterization of (Ti, Al)N films deposited by off-plane double bend filtered cathodic vacuum arc

Y. H. Cheng^*, B. K. Tay, S. P. Lau, X. Shi, H. C. Chua

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

At room temperature, an off-plane double bend filtered cathodic vacuum arc technique is used to deposit (Ti,Al)N films under a nitrogen atmosphere. The surface morphology of the deposited films is analyzed using SEM and atomic force microscopy. The films are also studied based on their composition and bond structure using XPS.

Original language	English
Pages (from-to)	557-562
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	19
Issue number	2
DOIs	https://doi.org/10.1116/1.1351063
Publication status	Published - Mar 2001
Externally published	Yes

ASJC Scopus Subject Areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.1351063

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title = "Characterization of (Ti, Al)N films deposited by off-plane double bend filtered cathodic vacuum arc",

abstract = "At room temperature, an off-plane double bend filtered cathodic vacuum arc technique is used to deposit (Ti,Al)N films under a nitrogen atmosphere. The surface morphology of the deposited films is analyzed using SEM and atomic force microscopy. The films are also studied based on their composition and bond structure using XPS.",

author = "Cheng, {Y. H.} and Tay, {B. K.} and Lau, {S. P.} and X. Shi and Chua, {H. C.}",

year = "2001",

month = mar,

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language = "English",

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AU - Cheng, Y. H.

AU - Tay, B. K.

AU - Lau, S. P.

AU - Shi, X.

AU - Chua, H. C.

PY - 2001/3

Y1 - 2001/3

N2 - At room temperature, an off-plane double bend filtered cathodic vacuum arc technique is used to deposit (Ti,Al)N films under a nitrogen atmosphere. The surface morphology of the deposited films is analyzed using SEM and atomic force microscopy. The films are also studied based on their composition and bond structure using XPS.

AB - At room temperature, an off-plane double bend filtered cathodic vacuum arc technique is used to deposit (Ti,Al)N films under a nitrogen atmosphere. The surface morphology of the deposited films is analyzed using SEM and atomic force microscopy. The films are also studied based on their composition and bond structure using XPS.

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DO - 10.1116/1.1351063

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SN - 0734-2101

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JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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Characterization of (Ti, Al)N films deposited by off-plane double bend filtered cathodic vacuum arc

Abstract

ASJC Scopus Subject Areas

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