Abstract
We effectively tailored the charge trapping and transport behavior of a carbon nanotube field effect transistor memory device using charge interaction with underlying Ge nanoparticles in a HfO2 high-κ dielectric. We also suggest a new route for modulating the Schottky barrier at the nanotube-electrode interface with localized charge trapping in discrete nanoparticles. This modification leads to an effective increase in the read-out conductance ratio of two to three orders magnitude under low voltage operation, associated with a large memory window of ∼5.3 V. Furthermore, we achieved a more controllable and reliable memory effect due to stable charge storage in deep nanoparticle traps, as compared to shallow HfO2 defect states.
Original language | English |
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Pages (from-to) | 3063-3070 |
Number of pages | 8 |
Journal | Carbon |
Volume | 47 |
Issue number | 13 |
DOIs | |
Publication status | Published - Nov 2009 |
Externally published | Yes |
ASJC Scopus Subject Areas
- General Chemistry
- General Materials Science