Abstract
This paper performs comprehensive analysis on datasets for occlusion-aware face segmentation, a task that is crucial for many downstream applications. The collection and annotation of such datasets are time-consuming and labor-intensive. Although some efforts have been made in synthetic data generation, the naturalistic aspect of data remains less explored. In our study, we propose two occlusion generation techniques, Naturalistic Occlusion Generation (NatOcc), for producing high-quality naturalistic synthetic occluded faces; and Random Occlusion Generation (RandOcc), a more general synthetic occluded data generation method (Figure 1). We empirically show the effectiveness and robustness of both methods, even for unseen occlusions. To facilitate model evaluation, we present two high-resolution real-world occluded face datasets with finegrained annotations, RealOcc and RealOcc-Wild, featuring both careful alignment preprocessing and an in-the-wild setting for robustness test. We further conduct a comprehensive analysis on a newly introduced segmentation benchmark, offering insights for future exploration. Our code and dataset are available at https://github.com/kennyvoo/face-occlusion-generation.
Original language | English |
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Title of host publication | Proceedings - 2022 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops, CVPRW 2022 |
Publisher | IEEE Computer Society |
Pages | 4710-4719 |
Number of pages | 10 |
ISBN (Electronic) | 9781665487399 |
DOIs | |
Publication status | Published - 2022 |
Externally published | Yes |
Event | 2022 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops, CVPRW 2022 - New Orleans, United States Duration: Jun 19 2022 → Jun 24 2022 |
Publication series
Name | IEEE Computer Society Conference on Computer Vision and Pattern Recognition Workshops |
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Volume | 2022-June |
ISSN (Print) | 2160-7508 |
ISSN (Electronic) | 2160-7516 |
Conference
Conference | 2022 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops, CVPRW 2022 |
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Country/Territory | United States |
City | New Orleans |
Period | 6/19/22 → 6/24/22 |
Bibliographical note
Publisher Copyright:© 2022 IEEE.
ASJC Scopus Subject Areas
- Computer Vision and Pattern Recognition
- Electrical and Electronic Engineering