Deposition of osmium and ruthenium thin films from organometallic cluster precursors

Chunxiang Li; Weng Kee Leong; Kian Ping Loh

doi:10.1002/aoc.1494

Deposition of osmium and ruthenium thin films from organometallic cluster precursors

Chunxiang Li, Weng Kee Leong, Kian Ping Loh

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs₃(CO)M ₁₃(μ-H)₂ have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively.

Original language	English
Pages (from-to)	196-199
Number of pages	4
Journal	Applied Organometallic Chemistry
Volume	23
Issue number	5
DOIs	https://doi.org/10.1002/aoc.1494
Publication status	Published - May 2009
Externally published	Yes

ASJC Scopus Subject Areas

General Chemistry
Inorganic Chemistry

Keywords

Alloy
Cluster
CVD
Osmium
Ruthenium

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10.1002/aoc.1494

Cite this

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abstract = "Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs3(CO)M 13(μ-H)2 have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively.",

keywords = "Alloy, Cluster, CVD, Osmium, Ruthenium",

author = "Chunxiang Li and Leong, {Weng Kee} and Loh, {Kian Ping}",

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AU - Leong, Weng Kee

AU - Loh, Kian Ping

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N2 - Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs3(CO)M 13(μ-H)2 have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively.

AB - Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs3(CO)M 13(μ-H)2 have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively.

KW - Alloy

KW - Cluster

KW - CVD

KW - Osmium

KW - Ruthenium

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DO - 10.1002/aoc.1494

M3 - Article

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JO - Applied Organometallic Chemistry

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ER -

Deposition of osmium and ruthenium thin films from organometallic cluster precursors

Abstract

ASJC Scopus Subject Areas

Keywords

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