Abstract
The deposition of TiN films by an off-plane double bend filtered cathodic vacuum arc (FCVA) technique at low deposition pressure at a very high deposition rate was discussed. The composition, structure and surface morphology of the films were also characterized. The X-ray photoelectron spectroscopy, X-ray diffraction and atomic force microscopy were used.
| Original language | English |
|---|---|
| Pages (from-to) | 1609-1615 |
| Number of pages | 7 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 21 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 2003 |
| Externally published | Yes |
ASJC Scopus Subject Areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films