Abstract
A unique laser lithography system is designed to fulfill the patterning needs of electronic and optoelectronic device fabrication on a wide variety of substrates, and to support research and development. This maskless laser writing system generates standard patterns for system calibration and for simple device layouts. It also writes using data input from industry standard CIF-format layouts. The laser writer has been engaged to write on a variety of substrate materials: semiconductor (GaAs and silicon), polycrystalline diamond film, polythiophene polymer film, and sol-gel glass film, which demonstrate its patterning versatility.
| Original language | English |
|---|---|
| Pages | 263-264 |
| Number of pages | 2 |
| Publication status | Published - 1997 |
| Externally published | Yes |
| Event | Proceedings of the 1997 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim - Chiba, Jpn Duration: Jul 14 1997 → Jul 18 1997 |
Conference
| Conference | Proceedings of the 1997 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim |
|---|---|
| City | Chiba, Jpn |
| Period | 7/14/97 → 7/18/97 |
ASJC Scopus Subject Areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Electrical and Electronic Engineering