Direct measurement of proton-beam-written polymer optical waveguide sidewall morphorlogy using an atomic force microscope

T. C. Sum*, A. A. Bettiol, H. L. Seng, J. A. Van Kan, F. Watt

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

The atomic force microscopy (AFM) technique was used to investigate the sidewall morphologies of proton-beam-written polymer waveguide structures fabricated with different stage scanning speeds. The proton-beam writing (PBW) is a direct-write micromachining technique capable of fabaricating low-loss single-mode polymer waveguides with straight and smooth sidewalls. The statistical information such as the rms roughness and the correlation length of the sidewall profile obtained from AFM scans allowed the quantification of the quality of the sidewalls and optimization of the fabrication parameters using PBW. The results show a rms roughness of 3.8±0.3 nm for a stage scanning speed of ∼10 μm/s.

Original languageEnglish
Pages (from-to)1398-1400
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number8
DOIs
Publication statusPublished - Aug 23 2004
Externally publishedYes

ASJC Scopus Subject Areas

  • Physics and Astronomy (miscellaneous)

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