Dopant distribution in the recrystallization transient at the maximum melt depth induced by laser annealing

K. K. Ong*, K. L. Pey, P. S. Lee, A. T.S. Wee, X. C. Wang, Y. F. Chong

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

107 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Dopant distribution in the recrystallization transient at the maximum melt depth induced by laser annealing'. Together they form a unique fingerprint.

Material Science

Engineering

Keyphrases