Effect of exposure dose on the replication fidelity and profile of very high aspect ratio microchannels in SU-8

We are interested in using SU-8 dense gratings with very high aspect ratio microchannels as the master mold for fabrication of child molds needed for replication. For such applications, the sidewall taper angle and mask replication fidelity of SU-8 are very important. Increasing the exposure time was experimentally observed to decrease the width of the microchannel and the sidewall angle of SU-8 bars. A new diffraction-refraction-reflection model was also developed. The calculated microchannel width and sidewall angle at high exposure dose agreed well with the experimentally observed values indicating that reflection at the silicon substrate was significant. The larger than calculated actual microchannel width for low exposure dose was shown to be due to leaching of unreacted SU-8 in the developer. Dense gratings of high aspect ratio SU-8 bars separated by high aspect ratio (19.1) microchannels were also demonstrated.