Effective photoluminescence modification of ZnO nanocombs by plasma immersion ion implantation

Y. Yang*, B. K. Tay, X. W. Sun, Z. J. Han, Z. X. Shen, C. Lincoln, T. Smith

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

Surface defects passivation of ZnO nanocombs was performed through a Ti plasma immersion ion implantation (PIII) with low bias voltages ranging from 0-10 kV. The room temperature near-band-edge emission was enhanced for modified ZnO nanostructures while the defect-related green band was completely quenched. Detailed temperature dependence PL revealed that the deep-level emissions were surface related and it was the most affected recombination processes by PIII, whereas the surface exciton related emission was slowly quenched as the ion energy increased. Time-resolved PL shows that the lifetime of the UV emission has been enhanced whereas the long lifetime of visible emission of the untreated ZnO nanocombs has been largely shortened. Our work demonstrates that metal ion PIII can be an effective way for surface modification/passivation of ZnO nanostructures to improve the optical properties.

Original languageEnglish
Title of host publication2008 2nd IEEE International Nanoelectronics Conference, INEC 2008
Pages20-24
Number of pages5
DOIs
Publication statusPublished - 2008
Externally publishedYes
Event2008 2nd IEEE International Nanoelectronics Conference, INEC 2008 - Shanghai, China
Duration: Mar 24 2008Mar 27 2008

Publication series

Name2008 2nd IEEE International Nanoelectronics Conference, INEC 2008

Conference

Conference2008 2nd IEEE International Nanoelectronics Conference, INEC 2008
Country/TerritoryChina
CityShanghai
Period3/24/083/27/08

ASJC Scopus Subject Areas

  • Electrical and Electronic Engineering

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