Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films

H. J. Fan; M. H. Kuok; S. C. Ng; H. S. Lim; N. N. Liu; R. Boukherroub; D. J. Lockwood

doi:10.1063/1.1583148

Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films

H. J. Fan, M. H. Kuok^*, S. C. Ng, H. S. Lim, N. N. Liu, R. Boukherroub, D. J. Lockwood

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

The effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films were analyzed. The acoustic mode frequencies were observed to decrease with increasing oxidation time. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous silica glass film.

Original language	English
Pages (from-to)	1243-1247
Number of pages	5
Journal	Journal of Applied Physics
Volume	94
Issue number	2
DOIs	https://doi.org/10.1063/1.1583148
Publication status	Published - Jul 15 2003
Externally published	Yes

ASJC Scopus Subject Areas

General Physics and Astronomy

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10.1063/1.1583148

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title = "Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films",

abstract = "The effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films were analyzed. The acoustic mode frequencies were observed to decrease with increasing oxidation time. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous silica glass film.",

author = "Fan, {H. J.} and Kuok, {M. H.} and Ng, {S. C.} and Lim, {H. S.} and Liu, {N. N.} and R. Boukherroub and Lockwood, {D. J.}",

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AU - Fan, H. J.

AU - Kuok, M. H.

AU - Ng, S. C.

AU - Lim, H. S.

AU - Liu, N. N.

AU - Boukherroub, R.

AU - Lockwood, D. J.

PY - 2003/7/15

Y1 - 2003/7/15

N2 - The effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films were analyzed. The acoustic mode frequencies were observed to decrease with increasing oxidation time. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous silica glass film.

AB - The effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films were analyzed. The acoustic mode frequencies were observed to decrease with increasing oxidation time. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous silica glass film.

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Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films

Abstract

ASJC Scopus Subject Areas

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