Abstract
The influence of deposition conditions on the microstructure of Ca 3Co4O9 (CCO) thin films fabricated by the pulsed laser deposition technique was investigated. X-ray diffraction revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the Ca xCoO2 secondary phase. The Ca x CoO2 structure was further confirmed by high-resolution transmission electron microscopy. The CCO thin-film growth was deduced to be a kinetically controlled process, and the quality of the thin films strongly depended on the coalescence process. The formation of Ca xCoO 2 was inevitable during the thin-film growth. However, given enough time and supply of oxygen at a lower deposition rate, it was possible to transform the CaxCoO2 phase into the desired CCO phase during the coalescence process, while with faster deposition, more Ca xCoO2 structure was formed, and the secondary phase could hardly transform into the CCO phase.
Original language | English |
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Pages (from-to) | 1611-1615 |
Number of pages | 5 |
Journal | Journal of Electronic Materials |
Volume | 39 |
Issue number | 9 |
DOIs | |
Publication status | Published - Sept 2010 |
Externally published | Yes |
ASJC Scopus Subject Areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry
Keywords
- PLD
- Thermoelectric
- thin films