Effects of pulsed laser deposition conditions on the microstructure of Ca3Co4O9 thin films

Ting Sun*, Huey Hoon Hng, Qingyu Yan, Jan Ma

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

The influence of deposition conditions on the microstructure of Ca 3Co4O9 (CCO) thin films fabricated by the pulsed laser deposition technique was investigated. X-ray diffraction revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the Ca xCoO2 secondary phase. The Ca x CoO2 structure was further confirmed by high-resolution transmission electron microscopy. The CCO thin-film growth was deduced to be a kinetically controlled process, and the quality of the thin films strongly depended on the coalescence process. The formation of Ca xCoO 2 was inevitable during the thin-film growth. However, given enough time and supply of oxygen at a lower deposition rate, it was possible to transform the CaxCoO2 phase into the desired CCO phase during the coalescence process, while with faster deposition, more Ca xCoO2 structure was formed, and the secondary phase could hardly transform into the CCO phase.

Original languageEnglish
Pages (from-to)1611-1615
Number of pages5
JournalJournal of Electronic Materials
Volume39
Issue number9
DOIs
Publication statusPublished - Sept 2010
Externally publishedYes

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Keywords

  • PLD
  • Thermoelectric
  • thin films

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