Effects of silicon substrate on the growth of carbon nanotubes

K. P. Yung, J. Wei, R. Y.J. Tay, B. K. Tay

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Due to their extraordinary electrical, thermal and mechanical properties, carbon nanotubes (CNTs) have been foreseen as potential materials for electronics devices in the future. To integrate CNTs in electronic applications, CNTs would need to be deposited on different types of Si substrate. In this study, CNTs were grown on Ni catalyst layer with four types of substrates, namely Si, n++ Si, p++ Si and SiO2, using Plasma Enhanced Chemical Vapor Deposition (PECVD). The morphology and microstructure of the CNT films were analyzed by scanning electron microscopy (SEM) and Raman spectroscope. It was found that the type of Si substrate has significant effects on CNT growing characteristics. The possible mechanisms for the observed results are proposed. These findings add significant reference value to select deposition conditions suitable for deposition of CNTs on different types of Si substrate.

Original languageEnglish
Title of host publicationProceedings of the ASME International Mechanical Engineering Congress and Exposition 2009, IMECE 2009
PublisherAmerican Society of Mechanical Engineers (ASME)
Pages143-148
Number of pages6
ISBN (Print)9780791843789
DOIs
Publication statusPublished - 2010
Externally publishedYes
Event2009 ASME International Mechanical Engineering Congress and Exposition, IMECE2009 - Lake Buena Vista, FL, United States
Duration: Nov 13 2009Nov 19 2009

Publication series

NameASME International Mechanical Engineering Congress and Exposition, Proceedings
Volume5

Conference

Conference2009 ASME International Mechanical Engineering Congress and Exposition, IMECE2009
Country/TerritoryUnited States
CityLake Buena Vista, FL
Period11/13/0911/19/09

ASJC Scopus Subject Areas

  • Mechanical Engineering

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