Effects of substrate temperature on the properties of tetrahedral amorphous carbon films

B. K. Tay*, X. Shi, E. J. Liu, H. S. Tan, L. K. Cheah

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)

Abstract

Tetrahedral amorphous carbon (ta-C) films were deposited by the filtered cathodic vacuum arc technique with substrate temperature ranging from 25 to 400 °C. A transition from diamond-like properties to graphitic properties was observed for deposition above a threshold temperature value, which is found to increase from 200 to 300 °C for films deposited at different ion energies of 60 and 100 eV, respectively. These changes of properties upon transition include a change in the surface roughness, compressive stress and Raman spectra. The variation of results is consistent with the subplantation model, which emphasizes the role of carbon atoms trapped in the subsurface layers in the evolution of a dense sp3 rich phase at room temperature. At higher temperature, diffusion of carbon atoms to the surface of the evolving film releases internal stress and leads to the formation of a graphitic sp2 phase.

Original languageEnglish
Pages (from-to)155-161
Number of pages7
JournalThin Solid Films
Volume346
Issue number1
DOIs
Publication statusPublished - Jun 1 1999
Externally publishedYes

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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