Abstract
Pit formation via electrochemical oxidation has been identified as one of the critical degradation mechanisms in AlGaN/GaN high electron mobility transistors. It is known to be strongly influenced by the electric field, temperature and stressing environment. In this paper, we will extend this understanding to include the role of threading dislocations, current density and the density of the passivation layer.
Original language | English |
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Title of host publication | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 71-73 |
Number of pages | 3 |
ISBN (Electronic) | 9781538665084 |
DOIs | |
Publication status | Published - Mar 2019 |
Externally published | Yes |
Event | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, Singapore Duration: Mar 12 2019 → Mar 15 2019 |
Publication series
Name | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 |
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Conference
Conference | 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 |
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Country/Territory | Singapore |
City | Singapore |
Period | 3/12/19 → 3/15/19 |
Bibliographical note
Publisher Copyright:© 2019 IEEE.
ASJC Scopus Subject Areas
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Hardware and Architecture
Keywords
- AlGaN/GaN HEMTs
- electrochemical oxidation
- reliability
- threading dislocations