Electrochemical Oxidation in AlGaN/GaN-on-Si High Electron Mobility Transistors

C. L. Gan, W. A. Sasangka, C. V. Thompson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Pit formation via electrochemical oxidation has been identified as one of the critical degradation mechanisms in AlGaN/GaN high electron mobility transistors. It is known to be strongly influenced by the electric field, temperature and stressing environment. In this paper, we will extend this understanding to include the role of threading dislocations, current density and the density of the passivation layer.

Original languageEnglish
Title of host publication2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages71-73
Number of pages3
ISBN (Electronic)9781538665084
DOIs
Publication statusPublished - Mar 2019
Externally publishedYes
Event2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, Singapore
Duration: Mar 12 2019Mar 15 2019

Publication series

Name2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Conference

Conference2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
Country/TerritorySingapore
CitySingapore
Period3/12/193/15/19

Bibliographical note

Publisher Copyright:
© 2019 IEEE.

ASJC Scopus Subject Areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Hardware and Architecture

Keywords

  • AlGaN/GaN HEMTs
  • electrochemical oxidation
  • reliability
  • threading dislocations

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