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Electromigration in copper damascene interconnects: Reservoir effects and failure analysis
Wei Shao*, A. V. Vairagar, Chih Hang Tung, Ze Liang Xie, Ahila Krishnamoorthy, S. G. Mhaisalkar
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
28
Citations
(Scopus)