Electron emission of carbon nitride films and mechanism for the nitrogen-lowered threshold in cold cathode

W. T. Zheng; J. J. Li; X. Wang; X. T. Li; Z. S. Jin; B. K. Tay; Chang Q. Sun

doi:10.1063/1.1594822

Electron emission of carbon nitride films and mechanism for the nitrogen-lowered threshold in cold cathode

W. T. Zheng^*, J. J. Li, X. Wang, X. T. Li, Z. S. Jin, B. K. Tay, Chang Q. Sun

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

35 Citations (Scopus)

Abstract

The electron emission of carbon films and mechanism for the nitrogen-lowered threshold in cold cathode were studied. Carbon nitride films were deposited on Si(001) substrates using rf magnetron sputtering high purity pyrolytic graphite in a pure N² discharge. It was found that the substrate temperature of 200°C, floating potential at the substrate, and the nitrogen partial pressure of 0.3 Pa were favorable to promote the reaction that lowers the work function.

Original language	English
Pages (from-to)	2741-2745
Number of pages	5
Journal	Journal of Applied Physics
Volume	94
Issue number	4
DOIs	https://doi.org/10.1063/1.1594822
Publication status	Published - Aug 15 2003
Externally published	Yes

ASJC Scopus Subject Areas

General Physics and Astronomy

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10.1063/1.1594822

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title = "Electron emission of carbon nitride films and mechanism for the nitrogen-lowered threshold in cold cathode",

abstract = "The electron emission of carbon films and mechanism for the nitrogen-lowered threshold in cold cathode were studied. Carbon nitride films were deposited on Si(001) substrates using rf magnetron sputtering high purity pyrolytic graphite in a pure N2 discharge. It was found that the substrate temperature of 200°C, floating potential at the substrate, and the nitrogen partial pressure of 0.3 Pa were favorable to promote the reaction that lowers the work function.",

author = "Zheng, {W. T.} and Li, {J. J.} and X. Wang and Li, {X. T.} and Jin, {Z. S.} and Tay, {B. K.} and Sun, {Chang Q.}",

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AU - Zheng, W. T.

AU - Li, J. J.

AU - Wang, X.

AU - Li, X. T.

AU - Jin, Z. S.

AU - Tay, B. K.

AU - Sun, Chang Q.

PY - 2003/8/15

Y1 - 2003/8/15

N2 - The electron emission of carbon films and mechanism for the nitrogen-lowered threshold in cold cathode were studied. Carbon nitride films were deposited on Si(001) substrates using rf magnetron sputtering high purity pyrolytic graphite in a pure N2 discharge. It was found that the substrate temperature of 200°C, floating potential at the substrate, and the nitrogen partial pressure of 0.3 Pa were favorable to promote the reaction that lowers the work function.

AB - The electron emission of carbon films and mechanism for the nitrogen-lowered threshold in cold cathode were studied. Carbon nitride films were deposited on Si(001) substrates using rf magnetron sputtering high purity pyrolytic graphite in a pure N2 discharge. It was found that the substrate temperature of 200°C, floating potential at the substrate, and the nitrogen partial pressure of 0.3 Pa were favorable to promote the reaction that lowers the work function.

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DO - 10.1063/1.1594822

M3 - Article

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 4

ER -

Electron emission of carbon nitride films and mechanism for the nitrogen-lowered threshold in cold cathode

Abstract

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