Electron field emission from multilayered tetrahedral amorphous carbon films

X. Shi*, L. K. Cheah, S. R.P. Silva, B. K. Tay, H. S. Yang, Z. Sun

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Abstract

The electron emission switching property of the multilayer structures, which constitute of nitrogen doped tetrahedral amorphous carbon (n+-ta-C) film and intrinsic ta-C layer fabricated by the filtered cathodic vacuum arc (FCVA) technique has been investigated. Low voltage DC bias (9V) was applied between the top and bottom layers in conjunction with the conventional electric field applied between the cathode and anode. It has been demonstrated that by varying the low DC bias polarity, the on-set electric field for the electron emission can be varied by approx. ±6 V/μm compared to the unbiased situation. A possible mechanism for the multilayer field emission and the switching property is proposed.

Original languageEnglish
Pages (from-to)215-220
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume498
DOIs
Publication statusPublished - 1997
Externally publishedYes
EventProceedings of the 1997 MRS Fall Symposium - Boston, MA, USA
Duration: Dec 1 1997Dec 4 1997

ASJC Scopus Subject Areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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