Electron field emission from surface treated tetrahedraL amorphous carbon films

X. Shi*, L. K. Cheah, B. K. Tay, S. R.P. Silva

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)

Abstract

The electron field emission properties of tetrahedral amorphous carbon thin films deposited using a filtered cathodic vacuum arc system have improved as a result of surface treatment with H, O, and Ar ions. The limiting factor of the emission process does not appear to be only the front surface of the films. The improvement in the emission after ion beam treatment appears to be independent of the ions used. The surface which has been analyzed using ultraviolet photospectroscopy, reflected electron energy loss spectroscopy, and scanning tunneling microscopy shows evidence of the creation of segregated sp2 and sp3 rich regions of less than 20 nm in dimension. An extension to the space charge-induced band bending model including a multistep emission process that occurs in this mixed phase material is proposed.

Original languageEnglish
Pages (from-to)833-835
Number of pages3
JournalApplied Physics Letters
Volume74
Issue number6
DOIs
Publication statusPublished - Feb 8 1999
Externally publishedYes

ASJC Scopus Subject Areas

  • Physics and Astronomy (miscellaneous)

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