Abstract
The effects of carbon ion energy, nitrogen concentration, and surface post-treatment on the emission current density of amorphous carbon films were studied as a function of applied electric field and emission site density projected from indium tin oxide-coated glass. The emission site density of the film was characterized by atomic force microscopy, scanning tunneling microscopy, current imaging tunneling microscopy, and ultraviolet photospectroscopy techniques. The analyses showed the evident surface modification and more segregated cluster regions induced by ion beam treatment.
| Original language | English |
|---|---|
| Pages (from-to) | 6816-6821 |
| Number of pages | 6 |
| Journal | Journal of Applied Physics |
| Volume | 85 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - May 1 1999 |
| Externally published | Yes |
ASJC Scopus Subject Areas
- General Physics and Astronomy