Engineering atomic defects in hexagonal boron nitride via resonant optical excitation of phonons

M. Mehdi Jadidi*, Cecilia Y. Chen, Baichang Li, Jared S. Ginsberg, Sang Hoon Chae, Chaitali Joshi, Gauri Patwardhan, Kenji Watanabe, Takashi Taniguchi, James Hone, Alexander L. Gaeta

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We introduce an approach to engineer defects in hBN using intense pulses resonant with phonons at 7.3 µm. Such defects are highly subwavelength (< 30 nm) with an alignment sensitive to the polarization.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationQELS_Fundamental Science, CLEO_QELS 2020
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580767
DOIs
Publication statusPublished - 2020
Externally publishedYes
EventCLEO: QELS_Fundamental Science, CLEO_QELS 2020 - Washington, United States
Duration: May 10 2020May 15 2020

Publication series

NameOptics InfoBase Conference Papers
VolumePart F182-CLEO-QELS 2020
ISSN (Electronic)2162-2701

Conference

ConferenceCLEO: QELS_Fundamental Science, CLEO_QELS 2020
Country/TerritoryUnited States
CityWashington
Period5/10/205/15/20

Bibliographical note

Publisher Copyright:
CLEO 2020 © OSA 2020.

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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