Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer

Takashi Hisatomi; Hen Dotan; Morgan Stefik; Kevin Sivula; Avner Rothschild; Michaël Grätzel; Nripan Mathews

doi:10.1002/adma.201104868

Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer

Takashi Hisatomi, Hen Dotan, Morgan Stefik, Kevin Sivula, Avner Rothschild, Michaël Grätzel^*, Nripan Mathews

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

281 Citations (Scopus)

Abstract

A 2-nm thick Nb ₂O ₅ underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.

Original language	English
Pages (from-to)	2699-2702
Number of pages	4
Journal	Advanced Materials
Volume	24
Issue number	20
DOIs	https://doi.org/10.1002/adma.201104868
Publication status	Published - May 22 2012
Externally published	Yes

ASJC Scopus Subject Areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

Keywords

electron back injection
hematite
niobium oxide
photoelectrochemical water splitting
underlayer

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1002/adma.201104868

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abstract = "A 2-nm thick Nb 2O 5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.",

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AU - Hisatomi, Takashi

AU - Dotan, Hen

AU - Stefik, Morgan

AU - Sivula, Kevin

AU - Rothschild, Avner

AU - Grätzel, Michaël

AU - Mathews, Nripan

PY - 2012/5/22

Y1 - 2012/5/22

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AB - A 2-nm thick Nb 2O 5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.

KW - electron back injection

KW - hematite

KW - niobium oxide

KW - photoelectrochemical water splitting

KW - underlayer

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Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer

Abstract

ASJC Scopus Subject Areas

Keywords

UN SDGs

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