Abstract
The evolution of surface roughness during metal silicides phase transformation and coupling was discussed. The correlation of surface roughness with sheet resistance, film thickness and phase transformation were also studied. The results show that during metal/silicon reaction film surface roughness is due to the effect of nucleation and growth of metal silicides. It was also found that surface roughness increases as new phase are formed and decreases during grain growth.
| Original language | English |
|---|---|
| Pages (from-to) | 122-128 |
| Number of pages | 7 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 22 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - Jan 2004 |
| Externally published | Yes |
ASJC Scopus Subject Areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
