Fabrication of aligned carbon nanotubes on Cu catalyst by dc plasma-enhanced catalytic decomposition

Zhejuan Zhang, Maziar Shakerzadeh, Beng Kang Tay, Xiaocheng Li, Chongwei Tan, Li Feng Lin, Pingsheng Guo, Tao Feng, Zhuo Sun*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Aligned multi-walled carbon nanotubes (ACNTs) are deposited using copper (Cu) catalyst on Chromium (Cr)-coated substrate by plasma-enhanced chemical vapor deposition at temperature of 700 °C. Acetylene gas has been used as the carbon source while ammonia is used for diluting and etching. The thicknesses of Cu films on Cr-coated Si (100) substrates are controlled by deposition time of magnetron sputtering. The growth behaviors and quality of ACNTs are investigated by scanning electron microscopy (SEM) and transmission electron microscopy. The different performance of ACNTs on various Cu films is explained by referring to the graphitic order as detected by Raman spectroscopy. The results indicate that the ACNTs are formed in tip-growth model where Cu is used as a novel catalyst, and the thickness of Cu films is responsible to the diameter and quality of synthesized CNTs.

Original languageEnglish
Pages (from-to)6404-6407
Number of pages4
JournalApplied Surface Science
Volume255
Issue number12
DOIs
Publication statusPublished - Apr 1 2009
Externally publishedYes

ASJC Scopus Subject Areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Keywords

  • Aligned CNTs
  • Cooper catalyst
  • DC-PECVD

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