Fabrication of micro-optical components in polymer using proton beam writing

Andrew A. Bettiol; Kambiz Ansari; Tze Chien Sum; Jeroen A. Van Kan; Frank Watt

doi:10.1117/12.524300

Fabrication of micro-optical components in polymer using proton beam writing

Andrew A. Bettiol^*, Kambiz Ansari, Tze Chien Sum, Jeroen A. Van Kan, Frank Watt

^*Corresponding author for this work

National University of Singapore

Research output: Contribution to journal › Conference article › peer-review

18 Citations (Scopus)

Abstract

Proton beam writing is a new direct write lithographic technique that utilizes a high energy (MeV) submicron focused proton beam to machine or modify a material, usually a polymer. Structures made using p-beam writing have very smooth side walls, high aspect ratio, and a scale that can be easily matched to existing optical fiber technology (0.1 to 1000 μm). In this paper we demonstrate the use of proton beam writing for prototyping micro-optical components such as microlens arrays and gratings in positive and negative resist. The structures that are fabricated can be used for both rapid prototyping and for large scale replication with nanoimprint lithography.

Original language	English
Pages (from-to)	255-263
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5347
DOIs	https://doi.org/10.1117/12.524300
Publication status	Published - 2004
Externally published	Yes
Event	Micromachining Technology for Micro - Optics and Nano - Optics II - San Jose, CA., United States Duration: Jan 27 2004 → Jan 29 2004

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Keywords

Gratings
Microlens array
PMMA
Polymer
Proton beam writing
SU-8

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10.1117/12.524300

Cite this

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title = "Fabrication of micro-optical components in polymer using proton beam writing",

abstract = "Proton beam writing is a new direct write lithographic technique that utilizes a high energy (MeV) submicron focused proton beam to machine or modify a material, usually a polymer. Structures made using p-beam writing have very smooth side walls, high aspect ratio, and a scale that can be easily matched to existing optical fiber technology (0.1 to 1000 μm). In this paper we demonstrate the use of proton beam writing for prototyping micro-optical components such as microlens arrays and gratings in positive and negative resist. The structures that are fabricated can be used for both rapid prototyping and for large scale replication with nanoimprint lithography.",

keywords = "Gratings, Microlens array, PMMA, Polymer, Proton beam writing, SU-8",

author = "Bettiol, \{Andrew A.\} and Kambiz Ansari and Sum, \{Tze Chien\} and \{Van Kan\}, \{Jeroen A.\} and Frank Watt",

year = "2004",

doi = "10.1117/12.524300",

language = "English",

volume = "5347",

pages = "255--263",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Micromachining Technology for Micro - Optics and Nano - Optics II ; Conference date: 27-01-2004 Through 29-01-2004",

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T1 - Fabrication of micro-optical components in polymer using proton beam writing

AU - Bettiol, Andrew A.

AU - Ansari, Kambiz

AU - Sum, Tze Chien

AU - Van Kan, Jeroen A.

AU - Watt, Frank

PY - 2004

Y1 - 2004

N2 - Proton beam writing is a new direct write lithographic technique that utilizes a high energy (MeV) submicron focused proton beam to machine or modify a material, usually a polymer. Structures made using p-beam writing have very smooth side walls, high aspect ratio, and a scale that can be easily matched to existing optical fiber technology (0.1 to 1000 μm). In this paper we demonstrate the use of proton beam writing for prototyping micro-optical components such as microlens arrays and gratings in positive and negative resist. The structures that are fabricated can be used for both rapid prototyping and for large scale replication with nanoimprint lithography.

AB - Proton beam writing is a new direct write lithographic technique that utilizes a high energy (MeV) submicron focused proton beam to machine or modify a material, usually a polymer. Structures made using p-beam writing have very smooth side walls, high aspect ratio, and a scale that can be easily matched to existing optical fiber technology (0.1 to 1000 μm). In this paper we demonstrate the use of proton beam writing for prototyping micro-optical components such as microlens arrays and gratings in positive and negative resist. The structures that are fabricated can be used for both rapid prototyping and for large scale replication with nanoimprint lithography.

KW - Gratings

KW - Microlens array

KW - PMMA

KW - Polymer

KW - Proton beam writing

KW - SU-8

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DO - 10.1117/12.524300

M3 - Conference article

AN - SCOPUS:2142661568

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VL - 5347

SP - 255

EP - 263

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

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Y2 - 27 January 2004 through 29 January 2004

ER -

Fabrication of micro-optical components in polymer using proton beam writing

Abstract

ASJC Scopus Subject Areas

Keywords

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