Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application

Zhiwei Zhao; Beng Kang Tay; D. G. McCulloch; J. L. Peng

doi:10.1109/NANOEL.2006.1609694

Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application

Zhiwei Zhao, Beng Kang Tay^*, D. G. McCulloch, J. L. Peng

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Multilayer device with 8 nano-layers consisting of alternate TiO ₂ thin films (high refractive index) and Al₂O₃ thin films (low refractive index) have been successfully fabricated by filtered cathodic vacuum arc (FCVA) with two separate cathodic sources. Microstructure and element distribution of multilayer coatings were examined by TEM and electron energy loss spectroscopy (EELS), respectively. The results show that the interfaces of the layers are well defined and exhibit smooth, sharp and flat properties. Each layer with nano-thickness keeps amorphous structure as determined by the electron diffraction pattern and XRD. The bond nature in respective TiO₂ and Al₂O₃ layers is Ti ⁴⁺-O^2- and Al³⁺-O^2- and no atoms diffuse into the nearby layer as concluded by EELS measurements. Good homogeneity in microstructure and element distribution indicates the potential deposition of multilayer by FCVA for advanced performances including optical application.

Original language	English
Title of host publication	NanoSingapore 2006
Subtitle of host publication	IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings
Pages	85-88
Number of pages	4
DOIs	https://doi.org/10.1109/NANOEL.2006.1609694
Publication status	Published - 2006
Externally published	Yes
Event	2006 IEEE Conference on Emerging Technologies - Nanoelectronics - Singapore, Singapore Duration: Jan 10 2006 → Jan 13 2006

Publication series

Name	NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings
Volume	2006

Conference

Conference	2006 IEEE Conference on Emerging Technologies - Nanoelectronics
Country/Territory	Singapore
City	Singapore
Period	1/10/06 → 1/13/06

ASJC Scopus Subject Areas

General Engineering

Keywords

Nanotechnology
Simulation
Thin film devices

Access to Document

10.1109/NANOEL.2006.1609694

Cite this

Zhao, Z., Tay, B. K., McCulloch, D. G., & Peng, J. L. (2006). Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application. In NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings (pp. 85-88). Article 1609694 (NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings; Vol. 2006). https://doi.org/10.1109/NANOEL.2006.1609694

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title = "Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application",

abstract = "Multilayer device with 8 nano-layers consisting of alternate TiO 2 thin films (high refractive index) and Al2O3 thin films (low refractive index) have been successfully fabricated by filtered cathodic vacuum arc (FCVA) with two separate cathodic sources. Microstructure and element distribution of multilayer coatings were examined by TEM and electron energy loss spectroscopy (EELS), respectively. The results show that the interfaces of the layers are well defined and exhibit smooth, sharp and flat properties. Each layer with nano-thickness keeps amorphous structure as determined by the electron diffraction pattern and XRD. The bond nature in respective TiO2 and Al2O3 layers is Ti 4+-O2- and Al3+-O2- and no atoms diffuse into the nearby layer as concluded by EELS measurements. Good homogeneity in microstructure and element distribution indicates the potential deposition of multilayer by FCVA for advanced performances including optical application.",

keywords = "Nanotechnology, Simulation, Thin film devices",

author = "Zhiwei Zhao and Tay, \{Beng Kang\} and McCulloch, \{D. G.\} and Peng, \{J. L.\}",

year = "2006",

doi = "10.1109/NANOEL.2006.1609694",

language = "English",

isbn = "0780393589",

series = "NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings",

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Zhao, Z, Tay, BK, McCulloch, DG & Peng, JL 2006, Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application. in NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings., 1609694, NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings, vol. 2006, pp. 85-88, 2006 IEEE Conference on Emerging Technologies - Nanoelectronics, Singapore, Singapore, 1/10/06. https://doi.org/10.1109/NANOEL.2006.1609694

Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application. / Zhao, Zhiwei; Tay, Beng Kang; McCulloch, D. G. et al.
NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings. 2006. p. 85-88 1609694 (NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings; Vol. 2006).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application

AU - Zhao, Zhiwei

AU - Tay, Beng Kang

AU - McCulloch, D. G.

AU - Peng, J. L.

PY - 2006

Y1 - 2006

N2 - Multilayer device with 8 nano-layers consisting of alternate TiO 2 thin films (high refractive index) and Al2O3 thin films (low refractive index) have been successfully fabricated by filtered cathodic vacuum arc (FCVA) with two separate cathodic sources. Microstructure and element distribution of multilayer coatings were examined by TEM and electron energy loss spectroscopy (EELS), respectively. The results show that the interfaces of the layers are well defined and exhibit smooth, sharp and flat properties. Each layer with nano-thickness keeps amorphous structure as determined by the electron diffraction pattern and XRD. The bond nature in respective TiO2 and Al2O3 layers is Ti 4+-O2- and Al3+-O2- and no atoms diffuse into the nearby layer as concluded by EELS measurements. Good homogeneity in microstructure and element distribution indicates the potential deposition of multilayer by FCVA for advanced performances including optical application.

AB - Multilayer device with 8 nano-layers consisting of alternate TiO 2 thin films (high refractive index) and Al2O3 thin films (low refractive index) have been successfully fabricated by filtered cathodic vacuum arc (FCVA) with two separate cathodic sources. Microstructure and element distribution of multilayer coatings were examined by TEM and electron energy loss spectroscopy (EELS), respectively. The results show that the interfaces of the layers are well defined and exhibit smooth, sharp and flat properties. Each layer with nano-thickness keeps amorphous structure as determined by the electron diffraction pattern and XRD. The bond nature in respective TiO2 and Al2O3 layers is Ti 4+-O2- and Al3+-O2- and no atoms diffuse into the nearby layer as concluded by EELS measurements. Good homogeneity in microstructure and element distribution indicates the potential deposition of multilayer by FCVA for advanced performances including optical application.

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KW - Simulation

KW - Thin film devices

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Zhao Z, Tay BK, McCulloch DG, Peng JL. Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application. In NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings. 2006. p. 85-88. 1609694. (NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings). doi: 10.1109/NANOEL.2006.1609694

Fabrication of nanoscale multilayer device by filtered cathodic vacuum arc for optical Application

Abstract

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Keywords

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