Fabrication of patterned and non-patterned metallic nanowire arrays on silicon substrate

Gaurav Sharma; Ser Choong Chong; Liao Ebin; Cai Hui; Chee Lip Gan; Vaidyanathan Kripesh

doi:10.1016/j.tsf.2006.09.009

Fabrication of patterned and non-patterned metallic nanowire arrays on silicon substrate

Gaurav Sharma^*, Ser Choong Chong, Liao Ebin, Cai Hui, Chee Lip Gan, Vaidyanathan Kripesh

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

Patterned micropads, 50 micrometer (μm) in diameter, comprising of multiple metallic nanowires are fabricated directly on a silicon substrate. Nanoporous alumina membrane that is used as a template for electrodeposition of nanowires is synthesized by potentiostatic anodization of a thin film of aluminum. For patterned nanoporous film growth, prior to anodization the thin film of aluminum is patterned with SiO₂ that acts as an effective barrier to anodization. Nanopore diameter for the patterned thin film is varied from 39 to 150 nm by varying the anodization voltage from 20 to 195 V. The patterned nanoporous alumina thin film that is anodized at 60 V and is 1 μm thick is used as a template for electrodeposition of nickel nanowires. Nickel nanowires that are ∼ 5 μm long are also fabricated on a silicon substrate using a thicker alumina film as an electrodeposition template.

Original language	English
Pages (from-to)	3315-3322
Number of pages	8
Journal	Thin Solid Films
Volume	515
Issue number	7-8
DOIs	https://doi.org/10.1016/j.tsf.2006.09.009
Publication status	Published - Feb 26 2007
Externally published	Yes

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Keywords

Aluminum oxide
Anodic oxidation
Nanowires
Silicon
Silicon oxide
Thin film

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10.1016/j.tsf.2006.09.009

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title = "Fabrication of patterned and non-patterned metallic nanowire arrays on silicon substrate",

abstract = "Patterned micropads, 50 micrometer (μm) in diameter, comprising of multiple metallic nanowires are fabricated directly on a silicon substrate. Nanoporous alumina membrane that is used as a template for electrodeposition of nanowires is synthesized by potentiostatic anodization of a thin film of aluminum. For patterned nanoporous film growth, prior to anodization the thin film of aluminum is patterned with SiO2 that acts as an effective barrier to anodization. Nanopore diameter for the patterned thin film is varied from 39 to 150 nm by varying the anodization voltage from 20 to 195 V. The patterned nanoporous alumina thin film that is anodized at 60 V and is 1 μm thick is used as a template for electrodeposition of nickel nanowires. Nickel nanowires that are ∼ 5 μm long are also fabricated on a silicon substrate using a thicker alumina film as an electrodeposition template.",

keywords = "Aluminum oxide, Anodic oxidation, Nanowires, Silicon, Silicon oxide, Thin film",

author = "Gaurav Sharma and Chong, \{Ser Choong\} and Liao Ebin and Cai Hui and Gan, \{Chee Lip\} and Vaidyanathan Kripesh",

year = "2007",

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day = "26",

doi = "10.1016/j.tsf.2006.09.009",

language = "English",

volume = "515",

pages = "3315--3322",

journal = "Thin Solid Films",

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number = "7-8",

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T1 - Fabrication of patterned and non-patterned metallic nanowire arrays on silicon substrate

AU - Sharma, Gaurav

AU - Chong, Ser Choong

AU - Ebin, Liao

AU - Hui, Cai

AU - Gan, Chee Lip

AU - Kripesh, Vaidyanathan

PY - 2007/2/26

Y1 - 2007/2/26

N2 - Patterned micropads, 50 micrometer (μm) in diameter, comprising of multiple metallic nanowires are fabricated directly on a silicon substrate. Nanoporous alumina membrane that is used as a template for electrodeposition of nanowires is synthesized by potentiostatic anodization of a thin film of aluminum. For patterned nanoporous film growth, prior to anodization the thin film of aluminum is patterned with SiO2 that acts as an effective barrier to anodization. Nanopore diameter for the patterned thin film is varied from 39 to 150 nm by varying the anodization voltage from 20 to 195 V. The patterned nanoporous alumina thin film that is anodized at 60 V and is 1 μm thick is used as a template for electrodeposition of nickel nanowires. Nickel nanowires that are ∼ 5 μm long are also fabricated on a silicon substrate using a thicker alumina film as an electrodeposition template.

AB - Patterned micropads, 50 micrometer (μm) in diameter, comprising of multiple metallic nanowires are fabricated directly on a silicon substrate. Nanoporous alumina membrane that is used as a template for electrodeposition of nanowires is synthesized by potentiostatic anodization of a thin film of aluminum. For patterned nanoporous film growth, prior to anodization the thin film of aluminum is patterned with SiO2 that acts as an effective barrier to anodization. Nanopore diameter for the patterned thin film is varied from 39 to 150 nm by varying the anodization voltage from 20 to 195 V. The patterned nanoporous alumina thin film that is anodized at 60 V and is 1 μm thick is used as a template for electrodeposition of nickel nanowires. Nickel nanowires that are ∼ 5 μm long are also fabricated on a silicon substrate using a thicker alumina film as an electrodeposition template.

KW - Aluminum oxide

KW - Anodic oxidation

KW - Nanowires

KW - Silicon

KW - Silicon oxide

KW - Thin film

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DO - 10.1016/j.tsf.2006.09.009

M3 - Article

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SN - 0040-6090

VL - 515

SP - 3315

EP - 3322

JO - Thin Solid Films

JF - Thin Solid Films

IS - 7-8

ER -

Fabrication of patterned and non-patterned metallic nanowire arrays on silicon substrate

Abstract

ASJC Scopus Subject Areas

Keywords

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